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Pemodelan induktor tap tengah berdasarkan teknologi 0.18μm cmos silterra / Loo Wai Kit

PEMODELAN INDUKTOR TAP TENGAH BERDASARKAN TEKNOLOGI 0.18μm CMOS SILTERRA_Loo Wai Kit_E3_2007_875000091_NI
Nowadays, as the demand for wireless communication continues to expand, the need for RFIC (Radio frequency Integrated Circuits) has become more important. Spiral inductors for RFIC circuits are critical for filtering and tuning purpose. However, a model which can model the substrate loss, skin-effect loss, and underpass leakage (due to via resistance) accurately either in low frequency or high frequency operation still does not exist. Thus, the inductor with maximum quality factor (Q) at the desired operating frequency and in the desired inductance value (L) is the current design trend. In this project, the on-chip octagonal center-tapped inductors (CTI) are designed using Silterra 0.18μm CMOS technology based on simulation approach. Two 1nH square CTIs are created in ASITIC with Q 5.76 and 6.36, respectively. They are simulated in ASITIC based on 2-port analysis and compared with the 2-port simulation results using IE3D, which results in Q 6.34 and 7.67, respectively. The square CTIs are edited into octagonal CTIs using Cadence VLE and simulated in IE3D based on 3-port analysis. The Q of the first square CTI which obtained from 3-port analysis is 6.49 while the Q of the first octagonal CTI, L1 is 6.75, increases approximately 4%. The Q of the second square CTI which obtained from 3-port analysis is 7.77 while the Q of the second octagonal CTI, L2 is 7.88, increases approximately 1.4%. Both 1nH octagonal CTIs are compared with the single-ended octagonal inductors with the same dimension. The Q of the CTI, L1 is 62.5% higher than the Q of single-ended inductor (4.15), while its L (1.02nH) is 59.6% higher than the L of single-ended inductor (0.64nH). The Q of the CTI, L2 is 45.5% higher than the Q of single-ended inductor (5.42), while its L (0.99nH) is 13.4% higher than the L of single-ended inductor (0.88nH). The dependencies of L and Q for the octagonal CTI on the variation of metal width (W), spacing (S), and number of turns (N) at low frequencies range and higher frequencies range are analyze. Physical models for both 1nH octagonal CTIs are created based on the simulation results. The substrate losses of the octagonal CTI are modeled by the RSub and CSub in the physical model.
Contributor(s):
Loo Wai Kit - Author
Primary Item Type:
Final Year Project
Identifiers:
Accession Number : 875000091
Language:
English
Subject Keywords:
high frequency; inductor; simulation
First presented to the public:
5/1/2007
Original Publication Date:
1/9/2018
Previously Published By:
Universiti Sains Malaysia
Place Of Publication:
School of Electrical & Electronic Engineering
Citation:
Extents:
Number of Pages - 104
License Grantor / Date Granted:
  / ( View License )
Date Deposited
2018-01-09 17:58:16.213
Date Last Updated
2019-01-07 11:24:32.9118
Submitter:
Nor Hayati Ismail

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Pemodelan induktor tap tengah berdasarkan teknologi 0.18μm cmos silterra / Loo Wai Kit1 2018-01-09 17:58:16.213